PRODUCTS
NanoBiz Korea
나노비즈코리아
tousimis
Automegasamdri®-936 - Touchscreen Series C for 6
tousimis
The New Supercritical Automegasamdri®-936 System was developed by our in-house design team whose goal was to listen to and incorporate your needs into our next generation.
The classic features you have come to expect for decades that enable smooth operation, precise control and reproducibility are again evident in our most current design.
The New Supercritical Automegasamdri®-936 System was developed by our in-house design team whose goal was to listen to and incorporate your needs into our next generation.
The classic features you have come to expect for decades that enable smooth operation, precise control and reproducibility are again evident in our most current design.
제품설명
• Process up to Five 6" (150mm) Wafers per Process Run
• Touchscreen Programmable Interface
• First Time Ever...Previous Run Data Review
• Integrated Chiller Loop Decreases LCO2 Consumption
• Easy Facilitation with Small Foot Print Design
tousimis catalog# 8788B
FEATURES
> A dedicated initial Slow Fill into the process chamber allows ideal fluid dynamics preserving the most sensitive micro devices.
> Maintenance made easy via accessible components including the external Post-Purge-Filter assembly.
> Patent Pending "Vortex Swirl": Non-mechanical stirring chamber allowing for fluid dynamic exchange without the need for particle generating friction causing devices.
> Extremely Efficient integrated Closed Cooling Loop dropping chamber temperature quickly for shorter process run times.
> The internal SOTER(tm) condenser quietly captures and separates CO2 exhaust and waste alcohols.
> Our original Chamber Inserts enable chamber I.D. variance of chamber I.D. maximizing efficiency in LCO2 consumption, process time, and providing multiple size wafer process capability!
> Process chamber LCO2 filtration down to 0.08µm with 99.999%+ particle retention.
> Processes up to five 6" (150mm) wafers each run. Included are the following HF Compatible Wafer Holders: 6" (150mm), 4" (100mm), 3" (75mm), 2" (50mm) and 10mm Die Holders.
> Chamber Illumination via viewing window facilitates chamber status visualization.
> Automatic process with factory default recipe or the ability to customize your own!
> All internal surfaces are inert to CO2 and ultrapure alcohols.
> Repeatable operating parameters insuring "reproducibility" of results.
> Safety operation features integrated into both temperature and pressure automatic regulation.
> All electronic components meet CE, UL and/or U.S. Military Specifications.
> Clean room static-free compatible design.
SPECIFICATIONS
> Cabinet: 19.8" (50.3cm) Width x 31.7" (80.6cm) Depth x 44.5" (113.0cm) Height
> System Set-Up Area Footprint: 27" (68.6cm) Width x 38" (96.5cm) Depth
> Chamber size: 6.50" I.D. x 1.25" Depth / Chamber volume: 679 ml
> 120V or 220V / 50-60Hz
> LCO2 flow is precisely controlled through Micro Metering Valves with Vernier handles for adjustment ease.
STANDARD ACCESSORIES
> High Pressure LCO2 flexi-SS316 Braided line for safe operation and easy installation 10ft/3m length included with system (Other lengths available upon request up to 100 ft/30m).
> Double T-Filter Assembly (#8785) pre-installed onto the chamber LCO2 supply high-pressure hose.
> Static free exhaust tubing included for all exhaust ports.
> Spare chamber O-rings (3), chamber lamp (1), and slo-blow fuses (2x3A and 2x8A).
> Chamber Inserts included: 6" to 4" / 4" to 3" / 3" to 2" / 2" to 1.25" ! Allows for multiple wafer size drying.
> HF compatible wafer holders included: 6" (150mm), 4" (100mm), 3" (75mm), 2" (50mm) and 10mm square die. Each holder can load up to five substrates each.
> 2 year warranty on all parts and labor.
> Free lifetime technical support.
