나노비즈코리아

Product Description

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Silicon nitride Si₃N₄ support membranes are suitable where carbon or plastic films are not appropriate. These silicon nitride membranes are extremely flat and smooth which significantly reduces the need for frequent re-focusing when scanning across large areas. The membranes have high stability under the electron beam and, being relatively chemically inert, are resistant to most chemicals with the exception of dilute HF, hot H₂SO₄ and free fluorine. The mechanical stability of the membrane allows a range of microscopy techniques, such as TEM, SEM and AFM, to be used for a variety of nanotechnology experiments. Cells, fibres and particles etc. can be mounted directly onto the support film and examined.

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This MFA consists of a 14.0mm x 14.0mm outer frame, containing a 4 x 4 array of TEM frames. Each of the individual frames within the sub-array contains a centred standard silicon nitride membrane.

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200µm substrate thickness, multi-frame array (4 x 4 array) with window size 0.50 x 0.50mm.

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