• Process up to Five 4" (100mm) Wafers per Process Run
• Touchscreen Programmable Interface
• First Time Ever...Previous Run Data Review
• Integrated Chiller Loop Decreases LCO2 Consumption
• Easy Facilitation with Small Foot Print Design
tousimis catalog# 8788A
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> A dedicated initial Slow Fill into the process chamber allows ideal fluid dynamics preserving the most sensitive micro devices.> Repeatable operating parameters insuring "reproducibility" of results.
> Maintenance made easy via accessible components including the external Post-Purge-Filter assembly.
> Patent Pending "Vortex Swirl": Non-mechanical stirring chamber allowing for fluid dynamic exchange without the need for particle generating friction causing devices.
> Extremely Efficient integrated Closed Cooling Loop dropping chamber temperature quickly for shorter process run times.
> The internal SOTER(tm) condenser quietly captures and separates CO2 exhaust and waste alcohols.
> Our original Chamber Inserts enable chamber I.D. variance of chamber I.D. maximizing efficiency in LCO2 consumption, process time, and providing multiple size wafer process capability!
> Process chamber LCO2 filtration down to 0.08µm with 99.999%+ particle retention.
> Processes up to five 4" (100mm) wafers each run. Included are the following HF Compatible Wafer Holders: 4" (100mm), 3" (75mm), 2" (50mm) and 10mm Die Holders.
> Chamber Illumination via viewing window facilitates chamber status visualization.
> Automatic process with factory default recipe or the ability to customize your own!
> All internal surfaces are inert to CO2 and ultrapure alcohols.
> Safety operation features integrated into both temperature and pressure automatic regulation.
> All electronic components meet CE, UL and/or U.S. Military Specifications.
> Clean room static-free compatible design.
> Cabinet: 19.8" (50.3cm) Width x 31.7" (80.6cm) Depth x 44.5" (113.0cm) Height
> System Set-Up Area Footprint: 27" (68.6cm) Width x 38" (96.5cm) Depth
> Chamber size: 4.50" I.D. x 1.25" Depth / Chamber volume: 326 ml
> 120V or 220V / 50-60Hz
> LCO2 flow is precisely controlled through Micro Metering Valves with Vernier handles for adjustment ease.
> High Pressure LCO2 flexi-SS316 Braided line for safe operation and easy installation 10ft/3m length included with system (Other lengths available upon request up to 100 ft/30m).
> Double T-Filter Assembly (#8785) pre-installed onto the chamber LCO2 supply high-pressure hose.
> Static free exhaust tubing included for all exhaust ports.
> Spare chamber O-rings (3), chamber lamp (1), and slo-blow fuses (2x3A and 2x8A).
> Chamber Inserts included: 4" to 3" / 3" to 2" / 2" to 1.25" ! Allows for multiple wafer size drying.
> HF compatible wafer holders included: 4" (100mm), 3" (75mm), 2" (50mm) and 10mm square die. Each holder can load up to five substrates each.
> 2 year warranty on all parts and labor.
> Free lifetime technical support.
> 8760-02: KNURL NUT for 4" and 6" Process Chamber > 8760-41: 3 AMP FUSE for Autosamdri®, Automegasamdri® and Touchscreen Series C > 8760-42: 8 AMP FUSE for Autosamdri®, Automegasamdri® and Touchscreen Series C > 8770-60: CHAMBER LID for 4" Process Chamber > 8785: Double T-Filter Assembly > 8770-83B: 0.5µm Stainless Steel Particulate Filter Element for LCO2 T-Filter or External Purge Line Filter. > 8770-46: Flow Meter - Use with any 2.5", 3.4" and 4.0" dia. Autosamdri® Chamber (60 SCFH) > 8770-54: LCO2 TANK SCALE W/ REMOTE DISPLAY > 8768B: 4" - 100mm HF Compatible Wafer Holder Holds 5 Wafers > 8768C: 3" - 75mm HF Compatible Wafer Holder Holds 5 Wafers > 8768D: 2" - 50mm HF Compatible Wafer Holder Holds 5 Wafers > 8768G: 1" - 25mm HF Compatible Wafer Holder Holds 5 Wafers > 8768E: 10mm Square HF Compatible Chip Holder, Holds 5 Die
Tousimis CPD : Critical Point Dryer Can be drying a sample without damage through the patented stasis mode.