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tousimis

Touchscreen Series C
Tousimis Touch Screen Series C (Cleanroom CriticalPointDry)

제품설명

TOUSIMIS HAS NOW INTEGRATED OUR AWARD WINNING AUTOSAMDRI®-931 SOFTWARE TECHNOLOGY WITH THE NEW SERIES C LINE HARDWARE TO FURTHER ENHANCE THE SERIES C

THE TOUSIMIS 'SERIES C' LINE HAS LED THE WAY IN RELIABILITY, YIELD, AND EFFICIENCY FOR OVER 15 YEARS IN BOTH INDUSTRIAL AND RESEARCH FACILITIES WORLDWIDE

  • A dedicated slow fill line allows for ideal internal chamber fluid dynamics for the most sensitive devices
  • Thermostatically controlled internal condenser
  • Temperature controlled valving
  • Stainless steel tubing with an internal filtration system down to 0.08 µm to protect samples and system function
  • Non mechanical stirring chamber allowing for fluid dynamic exchange without the need for particle generating friction causing devices
  • Chamber flexibility with inserts and holders allowing for processing processing up to 8" wafers, pieces and die
  • Made in U.S.A.     

  • ⤓ Download Brochure (PDF)  
Stasis Processing
•  Autosamdri®-934 (Cat #8788A)
      Touchscreen control automated CPD system for up to 5 x 4" Wafers
•  Automegasamdri®-936 (Cat #8788B)
      Touchscreen control automated CPD system for up to 5 x 6" Wafers
•  Automegasamdri®-938 (Cat #8788C)
                                                                                 Touchscreen control automated CPD system for up to 5 x 8" Wafers

     
Features
  • Bright LCD Touchscreen Control

  • > Use Factory Default Automatic Settings or Create Custom Recipes

  • > Optional "Stasis Software" (Patent Pending) for versatile sample types

  • > Process up to 5 wafers per process run with each system

  • > HF Compatible Wafer Holders and 10mm square holder included with each system

  • Tousimis® HF compatible Wafer Holders may be used to etch and process your wafers minimizing handling

  • Unique chamber inserts easily reduce chamber ID decreasing LCO2 consumption

  • High efficiency internal closed loop refrigeration integration

  • "Vortex Swirl" non-mechanical purge stirring (Patent Pending) eliminates moving parts for easy maintenance

  • Repeatable operating parameters insuring “reproducibility” of results

  • Static pressure control module helps insure automatic safe pressure stability

  • Internal filtration system delivers clean LCO2 into process chamber down to 0.08µm

  • New 'Slow Fill' Control for the most delicate Sample Types

  • LCO2 flow is controlled through Micro Metering Valves with Vernier handles for precise flow control and easy position setting readjustment

  • Chamber illumination with view port facilitates chamber status visualization

  • All internal surfaces are inert to CO2, Acetone and Ultrapure Alcohols

  • Cleanroom static-free compatible design

  • External mounted Post Purge Filter Assembly for EZ preventive maintenance maintenance

  • The patented internal SOTER™ Condenser quietly captures and separates CO2 exhaust and waste alcohols

  • All electronic components meet CE, UL and/or U.S. Military Specification

  • Cabinet: 19.8" (50.3cm) Width x 31.7" (80.6cm) Depth x 44.5" (113.0cm) Height

  • System Set-Up Area Footprint: 27" (68.6cm) Width x 38" (96.5cm) Depth x 44.5" (113cm) Height

  • 120V or 220V / 50-60Hz systems available
   Standard Accessories

   CPD Multi-Application


전화문의
02-923-3881
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