Light-Field System LF4-CUBE                                       

Removes contamination from samples and holder shafts
No re-contamination during observation
High-vacuum holder station: less than 1X10-4 Pa

Remove Contamination Mecanisum

A plasma cleaner cannot remove contamination over the entire holder surface, though it is effective for cleaning just the sample. That is, a plasma cleaner cannot perfectly clean the holder; the sample would be re-contaminated by residue materials from the holder shaft when observed by TEM.

Important points
1. All surfaces of both the holder and sample need cleaning.
2. Plasma damages the sample.

The LF4 system can clean both your sample and the entire holder surface under light and high vacuum without any sputtering damage. This improves your TEM and STEM data.

LF4 Other option and functions

LF4 Specification

Size and weight:	W366 x D435x H400(mm) 30kg
Power supply:	AC100V 5A (For 200VAC, a down-step transformer is required.)
Vacuum:	vacuum level is ≦ 1×10-4 Pa (Measured with dummy plug)/(see note 1)
Lighting anneal:	RT. to 150°C MAX Recommended temp. : 80-130°C
Supported holder:	FEI/JEOL/Hitachi200Kv TEM sample holders. Please specify your configuration when oredring (for example FEI 2ports, JEOL 2ports)
Environment:	Inside Application lab / Room Temperature 15-30°C No condensation

Note 1: At room temperature of 20 Degrees C, not using light baking function.
Note 2: Adjust the height of the light using our temperature measurement probe in advance
and calibrate the temperature before baking the holder.Do not exceed 150 °C.